Job Description
Responsible for developing advanced metrology solution for CD, profile, film thickness and topography using optical interferometry, reflectometry/ellipsometry, AFM and CDSEM. Candidate is expected to work closely with heads process development engineers to develop the new metrology solution with advanced algorithm, and to support daily metrology measurement operation for all development projects. Candidate will be part of a team that provide all aspects of metrology support for advanced magnetic recording heads process, and work in collaboration with the another dedicated manufacture metrology team.
Qualifications
REQUIRED
SKILLS
Additional Information
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